W/SiC X-ray multilayers optimized for use above 100 keV
Abstract
We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard X-ray reflective coatings operating in the energy range 100 - 200 keV. Grazing incidence X-ray reflectance at E=8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, while synchrotron radiation was used to measure the hard X-ray reflectance of a depth-graded multilayer designed specifically for use in the range E~150 - 170 keV. We have modeled the hard X-ray reflectance using newly-derived optical constants, which we determined from reflectance-vs-incidence angle measurements also made using synchrotron radiation, in the range E=120 - 180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard X-ray nuclear line telescope.
Additional Information
© 2003 Society of Photo-Optical Instrumentation Engineers (SPIE). This work was funded by an SR&T grant from NASA.Attached Files
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Additional details
- Eprint ID
- 84259
- Resolver ID
- CaltechAUTHORS:20180111-125339316
- NASA
- Created
-
2018-01-11Created from EPrint's datestamp field
- Updated
-
2021-11-15Created from EPrint's last_modified field
- Caltech groups
- Space Radiation Laboratory
- Series Name
- Proceedings of SPIE
- Series Volume or Issue Number
- 4851