Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo[4.2.1.0_(2,5)]non-7-enes
Abstract
Fluorinated tricyclo[4.2.1.0^(2,5)]non-7-ene-3-carboxylic acid esters are shown to undergo metal-catalyzed addition polymerization. The resulting homopolymers are transparent at 157 nm and demonstrate the utility of these monomers in development of photoresists for 157 nm lithography. Fluorinated tricyclononene (TCN) structures with ester substituents exhibit up to 3 orders of magnitude more transparency at 157 nm than conventional ester-functionalized norbornene structures as determined by gas-phase vacuum-ultraviolet spectroscopy and variable angle spectroscopic ellipsometry. Unlike their fluorinated norbornene counterparts, the fluorinated, ester-functionalized TCN monomers successfully undergo transition-metal-catalyzed addition polymerization to produce polymers with high glass transition temperatures and the etch resistance required for photolithographic resist materials applications. The potential use of fluorinated TCN structures for 157 nm photoresists is demonstrated through the synthesis and characterization of TCN monomers and polymers.
Additional Information
© 2003 American Chemical Society. Received 16 July 2002. Published online 11 February 2003. Published in print 1 March 2003. The authors gratefully acknowledge the generous funding of the International SEMATECH and its member companies. D.P.S. especially acknowledges Dr. Todd R. Younkin, Dr. John P. Morgan, and Dr. Hoang V. Tran for helpful discussions. SEMATECH employee Danny Miller is acknowledged for help with the VASE measurements.Attached Files
Supplemental Material - ma021131i_s.pdf
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Additional details
- Eprint ID
- 79229
- DOI
- 10.1021/ma021131i
- Resolver ID
- CaltechAUTHORS:20170720-073409305
- Sematech, Inc.
- Created
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2017-07-20Created from EPrint's datestamp field
- Updated
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2021-11-15Created from EPrint's last_modified field