Three-dimensional nanoimprint lithography using two-photon lithography master samples
Abstract
We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized objects with nanoscale features are three-dimensionally fabricated using two-photon lithography. Stamps made out of polydimethylsiloxane are then cast using the two-photon lithographically structured samples as master samples. Hereby, expensive serial nano 3-D printing is transformed into scalable parallel 3-D nanoimprint lithography. Furthermore, the transition from two-photon lithography to imprint lithography increases the freedom in substrate and ink choice significantly. We demonstrate printing on textured surfaces as well as residue-free printing with silver ink using capillary action.
Additional Information
The information, data, or work presented herein was funded in part by the U.S. Department of Energy, Energy Efficiency and Renewable Energy Program, under Award Number DE-EE0006335 and by the Bay Area Photovoltaics Consortium under Award Number DE-EE0004946. We thank Lucas Meza for two-photon lithography advice.Attached Files
Submitted - 1702.04012.pdf
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Additional details
- Eprint ID
- 78324
- Resolver ID
- CaltechAUTHORS:20170619-091636714
- DE-EE0006335
- Department of Energy (DOE)
- DE-EE0004946
- Department of Energy (DOE)
- Created
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2017-06-19Created from EPrint's datestamp field
- Updated
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2023-06-02Created from EPrint's last_modified field