Published May 2004
| public
Journal Article
Fabrication of Free-Standing Nanoscale Alumina Membranes with Controllable Pore Aspect Ratios
Abstract
Porous alumina films with controllable pore sizes and having submicrometer film thicknesses were fabricated by the anodization of Al overlayers. The Al was deposited by sputtering onto either glass or onto silicon that had been coated with a layer of silicon nitride. Alumina membranes having thicknesses between 300 and 1000 nm were prepared analogously using a lithographic process to produce free-standing porous alumina films that were peripherally supported on a 500-μm-thick silicon substrate.
Additional Information
© 2004 American Chemical Society. Received September 25, 2003; Revised Manuscript Received March 22, 2004. Publication Date (Web): April 23, 2004. We acknowledge the National Science Foundation (grant CHE-0213589) for supporting this work and the National University of Singapore for providing a fellowship to C.S.T. We also thank J. Casperson for assistance with the ion-milling process.Additional details
- Eprint ID
- 76171
- DOI
- 10.1021/nl0348286
- Resolver ID
- CaltechAUTHORS:20170408-162241423
- CHE-0213589
- NSF
- National University of Singapore
- Created
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2017-07-26Created from EPrint's datestamp field
- Updated
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2021-11-15Created from EPrint's last_modified field