Integrated MEMS metrology device using complementary measuring combs

Abstract

The present invention provides a device for in-situ monitoring of material, process and dynamic properties of a MEMS device. The monitoring device includes a pair of comb drives, a cantilever suspension comprising a translating shuttle operatively connected with the pair of comb drives, structures for applying an electrical potential to the comb drives to displace the shuttle, structures for measuring an electrical potential from the pair of comb drives; measuring combs configured to measure the displacement of the shuttle, and structures for measuring an electrical capacitance of the measuring combs. Each of the comb drives may have differently sized comb finger gaps and a different number of comb finger gaps. The shuttle may be formed on two cantilevers perpendicularly disposed with the shuttle, whereby the cantilevers act as springs to return the shuttle to its initial position after each displacement.

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