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Published November 24, 2015 | Supplemental Material
Journal Article Open

Holey Graphene as a Weed Barrier for Molecules

Abstract

We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.

Additional Information

© 2015 American Chemical Society. Received for review June 27, 2015, and accepted October 1, 2015. Publication Date (Web): October 1, 2015. We thank the Department of Energy Grant #DE-SC-0005025 for support of the instrumentation and methods developed and applied here. Partial support was provided by NSF Grant #ODISSEI-EFRI-1332411 and the Caltech EAS Discovery Fund (M.G. and W.A.G.). We also thank the NSF (Grant #EFRI-1433541) for support (X.F.D., S.J., and N.O.W.). J.C.T. acknowledges support from an excellence in chemistry graduate research fellowship from UCLA. P.S.W. acknowledges support from the Caltech Kavli Nanoscience Institute and Joint Center for Artificial Photosynthesis. We gratefully thank Jeffrey J. Schwartz, Ivo Atanasov, and Chih-Yen Chen for helpful discussions. The authors declare no competing financial interest.

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