Crystal Growth of Silicon and Germanium in Metal Films

Creators: Ottaviani, G.; Sigurd, D.; Marrello, V.; McCaldin, J. O.; Mayer, J. W.

Abstract

Amorphous silicon in contact with silver films and amorphous germanium in contact with aluminum films form crystalline precipitates when heated to temperatures well below those at which any liquid phase is present. Crystallization occurs by an initial dissolution of the semiconductor into the metal film solvent followed by the growth of crystals out of the solvent.

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© 1973 American Association for the Advancement of Science. Received 15 January 1973. We thank J. Devaney of the Jet Propulsion Laboratory for carrying out the scanning electron microscopy and H. J. Amel and R. Villagrana for carrying out the electron diffraction measurements. The work was supported in part by the Office of Naval Research.

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Crystal Growth of Silicon and Germanium in Metal Films

Abstract

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