Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published July 1, 2015 | public
Journal Article

A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

Abstract

Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe_3 and ozone and a temperature window of 200–300 °C, the growth rate was 80–110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

Additional Information

© 2015 Elsevier B.V. Received 29 August 2014; Received in revised form 6 April 2015; Accepted 9 April 2015; Available online 18 April 2015. This work was supported by the Joint Center for Artificial Photosynthesis, a DOE Energy Innovation Hub, supported through the Office of Science of the U.S. Department of Energy under Award Number DE-SC0004993. BSB was supported by the Beckmann Institute of California Institute of Technology. Research was in part carried out at the Molecular Materials Research Center of the Beckman Institute of the California Institute of Technology. LH would like to thank the VIDI project granted to Dr. Arno H.M. Smets by NWO-STW to financially support his stay in California Institute of Technology.

Additional details

Created:
August 22, 2023
Modified:
October 23, 2023