Published May 25, 2015
| public
Journal Article
Interfacial reactions in Ni/CoSb_3 couples at 450 ºC
Abstract
CoSb_3-based alloys are promising thermoelectric materials, and nickel is commonly used as barrier layer. This study examines interfacial reactions in the Ni/Sb and Ni/CoSb_3 couples reacted at 723 K. Three reaction phases, Ni_5Sb_2, NiSb and NiSb_2, are found in the Ni/Sb couples. In the Ni/CoSb_3 couples, the reaction path is Ni/Ni_5Sb_2/(Co,Ni)Sb/CoSb_3. Nickel is the fastest diffusion species, and the growth front is at the (Co,Ni)Sb/CoSb_3 interface. Co is the second fastest diffusion species, and a Co-rich region is formed at the Ni phase. The reaction layers grow with longer reaction time. Their average growth rates in the Ni/Sb and Ni/CoSb_3 couples reacted for 20 h are 1.1 μm/h and 1.0 μm/h, respectively.
Additional Information
© 2015 Elsevier B.V. Received 17 September 2014, Revised 23 December 2014, Accepted 4 January 2015, Available online 30 January 2015. The authors acknowledge the financial support of National Science Council of Taiwan (NSC102-3113-P-008-001).Additional details
- Eprint ID
- 56611
- DOI
- 10.1016/j.jallcom.2015.01.176
- Resolver ID
- CaltechAUTHORS:20150413-142939539
- NSC 101-3113-P-008-001
- National Science Council (Taipei)
- Created
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2015-04-13Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field