Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published 2013 | Published
Book Section - Chapter Open

Coupled thermoelastic simulation of nanovoid cavitation by dislocation emission at finite temperature

Abstract

In this work we study the early onset of void growth by dislocation emission at finite temperature in single crystal of copper under uniaxial loading conditions using the HotQC method. The results provide a detailed characterization of the cavitation mechanism, including the geometry of the emitted dislocations, the dislocation reaction paths and attendant macroscopic quantities of interest such as the cavitation pressure. In addition, this work shows that as prismatic dislocation loops grow and move away from the void, the material surrounded by these loops is pushed away from the void surface, giving rise to a flux of material together with a heat flux through the crystal.

Additional Information

© 2013 the authors. We gratefully acknowledge the support of the Ministerio de Ciencia e Innovaciόn of Spain (DPI2009-14305-C02-01) and the support of the Consejería de Innovaciόn of Junta de Andalucía (P09-TEP-4493). Support for this study was also provided by the Department of Energy National Nuclear Security Administration under Award Number DE-FC52-08NA28613 through Caltech's ASC/PSAAP Center for the Predictive Modeling and Simulation of High Energy Density Dynamic Response of Materials.

Attached Files

Published - Ponga_2013p1213.pdf

Files

Ponga_2013p1213.pdf
Files (2.5 MB)
Name Size Download all
md5:5114cdae4c462a866ffb0a56e177f20f
2.5 MB Preview Download

Additional details

Created:
August 19, 2023
Modified:
October 18, 2023