Retention of ion-implanted-xenon in olivine: Dependence on implantation dose

Abstract

The diffusion of Xe in olivine, a major mineral in both meteorites and lunar samples, was studied. Xe ions were implanted at 200 keV into single-crystal synthetic-forsterite targets and the depth profiles were measured by alpha particle backscattering before and after annealing for 1 hour at temperatures up to 1500°C. The fraction of implanted Xe retained following annealing was strongly dependent on the implantation dose. Maximum retention of 100% occurred for an implantion dose of 3 × 10^(15) Xe ions/cm^2. Retention was less at lower doses, with ≥ 50% loss at 1 × 10^(14) Xe ions/cm^2. Taking the diffusion coefficient at this dose as a lower limit, the minimum activation energy necessary for Xe retention in a 10 μm layer for 10^7 years was calculated as a function of metamorphic temperature. For example, an activation energy of 50 kcal/mole implies Xe retention may be possible for metamorphic temperatures below 500°C.

Additional details