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Published January 1984 | public
Journal Article

A new technique for measuring sputtering yields at high energies

Abstract

The use of thin, self-supporting carbon catcher foils allows one to measure sputtering yields in a broad range of materials with high sensitivity. Analyzing the foils with Rutherford forward scattering, we have measured sputtered Al, Si and P surface densities down to 5 × 10^(13) with uncertainties of about 20%.

Additional Information

© 1984 Published by Elsevier B.V. Received 5 August 1982 and in revised form 12 July 1983. Some preliminary experiments were skillfully executed by A. Anderson as a part of an undergraduate summer research project. We thank R. Miles, Wen Jin Meng, S. Trentalange and M. H. Mendenhall for their assistance. Supported in part by the National Science Foundation [PHY79-23638] and the National Aeronautics and Space Administration [AGW-202 and -148].

Additional details

Created:
August 19, 2023
Modified:
October 18, 2023