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Published November 13, 2013 | Supplemental Material
Journal Article Open

Photolithographic Olefin Metathesis Polymerization

Abstract

Patterning functional materials is a central challenge across many fields of science. The ability to lithographically fabricate micro- and nanostructures has been one of the most impactful technological breakthroughs of the last century. In part due to the complexity of the chemical processes in photoresists, there is a limited variety of materials that can currently be patterned by photolithography. We report a negative tone photoresist using a photoactivated olefin metathesis catalyst, which can be quickly prepared in a one-pot synthesis from commercially available starting materials. The resist is based on a ruthenium vinyl ether complex, widely regarded as inactive toward olefin metathesis. The combination of this photoactivated catalyst with the fidelity and functional group tolerance of ruthenium-mediated olefin metathesis enables a host of new possibilities for photopatterned materials.

Additional Information

Copyright © 2013 American Chemical Society. Received September 9, 2013. Publication Date (Web): October 30, 2013. This work is part of the Light-Material Interactions in Energy Conversion Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under Award Number DE-SC0001293. This research was conducted with Government support under and awarded by DoD, Air Force Office of Scientific Research, National Defense Science and Engineering Graduate (NDSEG) Fellowship, 32 CFR 168a, awarded to R.A.W. Profilometry was performed at the Molecular Materials Research Center of the Beckman Institute of the California Institute of Technology. R.A.W. thanks the Resnick Sustainability Institute for a graduate fellowship, and Jim Fakonas for many helpful discussions.

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August 19, 2023
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