Published December 1, 1999
| public
Journal Article
A multispecies step-flow model of growth of compound thin films by MOCVD
- Creators
- Jabbour, M.
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Bhattacharya, K.
Abstract
This paper presents a model of step-flow-mediated growth of a multispecies stoichiometric compound in the setting of MOCVD. The gas phase delivers adatoms of the different species to the terraces; these adatoms diffuse along the terraces until they reach the steps where they react to form the compound which is incorporated into the film. The model shows that possible blocking of open sites on the terrace and non-linear kinetics at the steps give rise to an unusual dependence of the deposition flux (growth rate) on the gas phase composition. A methodology for coupling this step-flow model to reactor-scale gas phase models is also proposed, and shown to be linearly stable.
Additional Information
© 1999 Elsevier Science S.A. It is a pleasure to thank D.G. Goodwin, R.V. Kohn, R.V. Kukta, L. Raja and E. Repetto for many useful discussions. Support from the National Science Foundation and the Defense Advanced Research Projects Agency under the initiative 'Modeling and Simulation of Advanced Materials Processes: Virtual Integrated Prototyping Initiative for Thin Films' is gratefully acknowledged.Additional details
- Eprint ID
- 41740
- DOI
- 10.1016/S0040-6090(99)00469-1
- Resolver ID
- CaltechAUTHORS:20131008-110352649
- NSF
- Defense Advanced Research Projects Agency (DARPA)
- Created
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2013-10-08Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field