Energy levels of semiconductor surface vacancies
- Creators
- Daw, M. S.
- Smith, D. L.
Abstract
We present calculations of the bound state energy levels of anion vacancies near the surface of a III–V semiconductor. We consider the (110) surface of GaAs, InP, and the Ga_(1−x)Al_(x)As alloy system. As the vacancy is moved toward the surface, the energy levels are only slightly perturbed until the vacancy reaches the second atomic layer from the surface. At this point, the anion vacancy levels move to lower energy. We find that there is a general trend in the vacancy energy levels with semiconductor ionicity. As the material becomes more ionic, the anion vacancy levels move to higher energy. Comparing this trend with experimentally observed Schottky barrier heights, we find a strong correlation between the position of the highest occupied level in the anion vacancy and the measured Fermi level at the surface. This result suggests that the recently proposed defect model is capable of accounting for observed trends in Schottky barrier formation.
Additional Information
© 1980 American Vacuum Society. Received 7 March 1980; accepted 15 April 1980. We thank T. C. McGill, W. E. Spicer, R H. Wieder, and R. H. Williams for valuable discussions on subjects related to this work and for sending us preprints of their papers prior to publication. We acknowledge the support of the Office of Naval Research under Contract No. N00014-79-C-0797. D. L. Smith acknowledges support from the Alfred P. Sloan Foundation.Attached Files
Published - DAWjvst80.pdf
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Additional details
- Eprint ID
- 32560
- Resolver ID
- CaltechAUTHORS:20120718-141135113
- N00014-79-C-0797
- Office of Naval Research (ONR)
- Alfred P. Sloan Foundation
- Created
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2012-07-18Created from EPrint's datestamp field
- Updated
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2021-11-09Created from EPrint's last_modified field