Parallel computing and the generation of basic plasma data
- Creators
- McKoy, Vincent
- Winstead, Carl
- Lee, Chuo-Han
Abstract
Comprehensive simulations of the processing plasmas used in semiconductor fabrication will depend on the availability of basic data for many microscopic processes that occur in the plasma and at the surface. Cross sections for electron collisions, a principal mechanism for producing reactive species in these plasmas, are among the most important such data; however, electron-collision cross sections are difficult to measure, and the available data are, at best, sketchy for the polyatomic feed gases of interest. While computational approaches to obtaining such data are thus potentially of significant value, studies of electron collisions with polyatomic gases at relevant energies are numerically intensive. In this article, we report on the progress we have made in exploiting large-scale distributed-memory parallel computers, consisting of hundreds of interconnected microprocessors, to generate electron-collision cross sections for gases of interest in plasma simulations.
Additional Information
Copyright 1998 American Vacuum Society. The following article appeared in Journal of Vacuum Science and Technology A and may be found at http://avspublications.org/jvsta/resource/1/jvtad6/v16/i1/p324_s1 . Received 11 April 1997; accepted 24 August 1997. This work was supported by Sematech, Inc., and by the National Science Foundation's Grand Challenge project on Parallel I/O Methodologies for I/O Intensive Grand Challenge Applications. Use of the computational facilities of the JPL/Caltech Supercomputing Project and of the Center for Advanced Computing Research is gratefully acknowledged.Attached Files
Published - MCKjvsta97.pdf
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Additional details
- Eprint ID
- 28964
- DOI
- 10.1116/1.580990
- Resolver ID
- CaltechAUTHORS:20120125-125735292
- Sematech, Inc.
- NSF Grand Challenge Project
- Created
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2012-02-28Created from EPrint's datestamp field
- Updated
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2021-11-09Created from EPrint's last_modified field