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Published October 21, 2010 | Supplemental Material
Journal Article Open

Contact Resistance for "End-Contacted" Metal−Graphene and Metal−Nanotube Interfaces from Quantum Mechanics

Abstract

In this paper, we predict the current−voltage (I−V) characteristics and contact resistance of "end-contacted" metal electrode−graphene and metal electrode−carbon nanotube (CNT) interfaces for five metals, Ti, Pd, Pt, Cu, and Au, based on the first-principles quantum mechanical (QM) density functional and matrix Green's function methods. We find that the contact resistance (normalized to surface C atoms) is 107 kΩ for Ti, 142 kΩ for Pd, 149 kΩ for Pt, 253 kΩ for Cu, and 187 kΩ for Au. This can be compared with the contact resistance (per C) for "side-contacted" metal−graphene or metal−CNT interfaces of 8.6 MΩ for Pd, 34.7 MΩ for Pt, 630 MΩ for Cu, etc. Those are in good agreement with available experimental results, 40.5 MΩ for Pt, for example. Thus, compared to the values for side-contacted interfaces from QM, we find a decrease in contact resistance by factors ranging from 6751 for Au and 2488 for Cu, to 233 for Pt and 60 Pd, to 8.8 for Ti. This suggests a strong advantage for developing technology to achieve "end-contacted" configurations.

Additional Information

© 2010 American Chemical Society. Received: July 21, 2008; Revised Manuscript Received: June 29, 2010. Published on Web 09/23/2010. This work was supported partially by Intel Components Research (Kevin O'Brien, Florian Gstrein, and James Blackwell) and by the National Science Foundation (CCF-0524490 and CTS-0608889). The computer systems used in this research were provided by ARO-DURIP and ONR-DURIP. Additional support for the MSC was provided by ONR, ARO, DOE, NIH, Chevron, Boehringer-Ingelheim, Pfizer, Allozyne, Nissan, Dow-Corning, and DuPont, with additional support by the Functional Engineered Nano Architectonics (FENA) via the Microelectronics Advanced Research Corporation (MARCO) with the prime award (2009-NT-2048) at UCLA (PI Kang Wang).

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