Published 2009
| public
Journal Article
BST Films Grown by Metal Organic Chemical Vapor Deposition Incorporating Real-Time Control of Stoichiometry
Abstract
We present preliminary results of metal organic chemical vapor deposition (MOCVD) growth of Ba_xSr_(1-x)TiO_3 (BST) thin films. Films were deposited on MgO, sapphire, Si, and Si/Pt/Ti substrates. Real-time monitoring of the precursor flux by UV absorption spectroscopy was used to control the composition of the films over the range 30 ≤ x ≤ 80. The films were characterized for a number of attributes including composition, crystalline structure, and morphology.
Additional Information
© 2009 Taylor & Francis Group, LLC. Received August 16, 2009; in final form November 23, 2009. This work has been generously supported by the Army Research Office award #W911NF-07-1-0359.Additional details
- Eprint ID
- 18676
- DOI
- 10.1080/10584580903586638
- Resolver ID
- CaltechAUTHORS:20100615-083857034
- W911NF-07-1-0359
- Army Research Office
- Created
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2010-06-17Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field