Nano/micro-mechanical and tribological characterization of Ar, C, N, and Ne ion-implanted Si
- Creators
- Xu, Zhi-Hui
- Park, Young-Bae
- Li, Xiaodong
Abstract
Ion implantation has been widely used to improve the mechanical and tribological properties of single crystalline silicon, an essential material for the semiconductor industry. In this study, the effects of four different ion implantations, Ar, C, N, and Ne ions, on the mechanical and tribological properties of single crystal Si were investigated at both the nanoscale and the microscale. Nanoindentation and microindentation were used to measure the mechanical properties and fracture toughness of ion-implanted Si. Nano and micro scratch and wear tests were performed to study the tribological behaviors of different ion-implanted Si. The relationship between the mechanical properties and tribological behavior and the damage mechanism of scratch and wear were also discussed.
Additional Information
© 2010 Materials Research Society. Received 16 May 2009; accepted 23 September 2009. Financial support for this study was provided by the National Science Foundation (CMMI-0653651, CMMI- 0824728 and EPS-0296165) and the University of South Carolina NanoCenter.Attached Files
Published - Xu2010p10070J_Mater_Res.pdf
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Additional details
- Eprint ID
- 18465
- Resolver ID
- CaltechAUTHORS:20100526-143959796
- CMMI-0653651
- NSF
- CMMI-0824728
- NSF
- EPS-0296165
- NSF
- University of South Carolina
- Created
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2010-06-20Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field